No.	Type of services	INOR Co-Supervision	Other USM’s school	IPTA/IPTS	Industry
MOCVD Laboratory *For further inquiry and booking, please email to anasahmad@usm.my (Office No.+604-653 5652)
1	MOCVD run (per hour) for requested sample (Max: 4” wafer)	1000	1500	2000	3000
2	Standard sample (In stock)	Please refer to the I-Shop brochure.
Characterization Laboratory *For further inquiry and booking, please email to azraai@usm.my (Office No.+604-6535646)
3	Probe Station w/o Sample Prep (per sample)
		a.)   CV Measurement	50	80	100	150
		b.)   IV Measurement	50	80	100	150
		· With Sample Prep (add on)	Additional charge depend on material
4	Photoluminescence (PL)	50	80	100	150
5	Electroluminescence (EL)	50	80	100	150
6	X-Ray Diffraction System (XRD)
		a.)  Powder/Phase Analysis
		(i).  Normal scan	100	120	150	300
		(ii).  Low noise background scan (Small quantity powder)	120	150	180	350
		b.)  Thin film
		(i).   Grazing Incidence Diffaction (GID)	120	150	180	350
		(ii).  X-ray Reflectivity (XRR)	120	150	180	350
		c.) Thin film with High Resolution (HR) measurement
		(i).   Rocking curve (RC)	150	200	300	500
		(ii).  Double-axis/Triple-Axis HRXRD
		· Standard Range (5 deg)	350	400	500	700
		· Extended Range (8 deg)	380	500	650	950
		(iii).Reciprocal Space Mapping (RSM)
		· Normal Scan	150	200	300	500
		· Ultra Fine Scan	Kindly consult with us
Fabrication Laboratory *For further inquiry and booking, please email to anasahmad@usm.my (Office No.+604-653 5652)
7	3-zone Furnace (per hour, max temp 11000C)
		a.)   Metalization	50	80	100	130
		b.)   Oxidation	80	100	120	150
8	Single zone furnace (per hour, max temp 11000C)
		a.)  Metalization	50	80	100	130
		b.)  Oxidation	50	80	100	130
9	3-zone furnace with NH3 cracker (Nitridation) (per hour, max temp 11000C)	100	150	200	350
10	Degas Vacuum System (per hour)	50	80	100	130
11	E-Beam Evaporator (per run, max 2 hours)
		a.)    w/o source material and crucible	200	350	380	500
		b.)    With material & crucible	Additional charge depend on material & thickness
12	Inductive Couple Plasma Etching System (ICP) (per run, max 2 hours)
		a.) Using Cl & BCl3 (eg. GaN)	250	350	450	600
		b.) Other gases except Cl & BCl3 (eg. Si, ITO, ZnO)	150	250	350	500
13	Rapid Thermal Processor System (RTP) (per run, max 1 hour)	80	100	150	300
14	UV-Ozone Cleaner (per run)	50	80	100	130
15	Hotplate with Stirrer (per hour)	50	80	100	130
16	Glove Box (Vacuum/Nitrogen) (per hour)	50	80	100	130
17	Optical Microscope (per hour)	50	80	100	130
18	Spin Coater (per hour)	50	80	100	130
19	Laminar Flow (per hour)	50	80	100	130
20	Fume Hood (per hour)	50	80	100	130
21	Direct write using maskless lithography (complete process) (per hour)
	a.)    Sample with pre-coat PR	Kindly consult with us
	*maskless lithography, developer (AZ300), optical microscope, UV-Ozone Cleaner)
	b.)    Sample without pre-coat PR	Kindly consult with us
	*HMDS, PR (limited to AznLoF2020), spinner, hot plate, ULPA laminar flow bench, maskless lithography, developer (AZ300), optical microscope, UV-Ozone Cleaner)
Lab Usage/Consultation Fee *For further inquiry and booking, please email to mundzir@usm.my (Office No. +604 653 5648)
		INOR Co-supervision					Industry
22	Lab usage fee (per person, per year)*	2000					-
	* Limit to the use of fume hood, basic consumables, and basic equipments (eg. hotplate, UV-Ozone cleaner, etc)
23	Consultation/analysis fee	Case By Case
24	Contract Services/Projects	Case By Case