INOR Laboratory Analysis Service Charges
| No. | Type of services | INOR Co-Supervision | Other USM’s school | IPTA/IPTS | Industry |
|---|---|---|---|---|---|
| MOCVD Laboratory *For further inquiry and booking, please email to anasahmad@usm.my | |||||
| 1 | MOCVD run (per hour) for requested sample (Max: 4” wafer) | 1000 | 1500 | 2000 | 3000 |
| 2 | Standard sample (In stock) | Please refer to the I-Shop brochure. | |||
| Characterization Laboratory *For further inquiry and booking, please email to azraai@usm.my | |||||
| 3 | Probe Station w/o Sample Prep (per sample) | ||||
| a.) CV Measurement | 50 | 80 | 100 | 150 | |
| b.) IV Measurement | 50 | 80 | 100 | 150 | |
| · With Sample Prep (add on) | Additional charge depend on material | ||||
| 4 | Photoluminescence (PL) | 50 | 80 | 100 | 150 |
| 5 | Electroluminescence (EL) | 50 | 80 | 100 | 150 |
| 6 | X-Ray Diffraction System (XRD) | ||||
| a.) Powder/Phase Analysis | |||||
| (i). Normal scan | 100 | 120 | 150 | 300 | |
| (ii). Low noise background scan (Small quantity powder) | 120 | 150 | 180 | 350 | |
| b.) Thin film | |||||
| (i). Grazing Incidence Diffaction (GID) | 120 | 150 | 180 | 350 | |
| (ii). X-ray Reflectivity (XRR) | 120 | 150 | 180 | 350 | |
| c.) Thin film with High Resolution (HR) measurement | |||||
| (i). Rocking curve (RC) | 150 | 200 | 300 | 500 | |
| (ii). Double-axis/Triple-Axis HRXRD | |||||
| · Standard Range (5 deg) | 150 | 200 | 300 | 500 | |
| · Extended Range (8 deg) | 180 | 300 | 450 | 750 | |
| (iii).Reciprocal Space Mapping (RSM) | |||||
| · Normal Scan | 150 | 200 | 300 | 500 | |
| · Ultra Fine Scan | 500 | 1000 | 1500 | 2000 | |
| Fabrication Laboratory *For further inquiry and booking, please email to anasahmad@usm.my | |||||
| 7 | 3-zone Furnace (per hour, max temp 11000C) | ||||
| a.) Metalization | 50 | 80 | 100 | 130 | |
| b.) Oxidation | 80 | 100 | 120 | 150 | |
| 8 | Single zone furnace (per hour, max temp 11000C) | ||||
| a.) Metalization | 30 | 50 | 80 | 120 | |
| b.) Oxidation | 50 | 80 | 100 | 130 | |
| 9 | 3-zone furnace with NH3 cracker (Nitridation) (per hour, max temp 11000C) | 100 | 150 | 200 | 350 |
| 10 | Degas Vacuum System (per hour) | 20 | 30 | 50 | 80 |
| 11 | E-Beam Evaporator (per run, max 2 hours) | ||||
| a.) w/o source material and crucible | 200 | 350 | 380 | 500 | |
| b.) With material & crucible | Additional charge depend on material & thickness | ||||
| 12 | Inductive Couple Plasma Etching System (ICP) (per run, max 2 hours) | ||||
| a.) Using Cl & BCl3 (eg. GaN) | 250 | 350 | 450 | 600 | |
| b.) Other gases except Cl & BCl3 (eg. Si, ITO, ZnO) | 150 | 250 | 350 | 500 | |
| 13 | Rapid Thermal Processor System (RTP) (per run, max 1 hour) | 80 | 100 | 150 | 300 |
| 14 | UV-Ozone Cleaner (per run) | 10 | 10 | 20 | 30 |
| 15 | Hotplate with Stirrer (per hour) | 10 | 10 | 20 | 30 |
| 16 | Glove Box (Vacuum/Nitrogen) (per hour) | 20 | 30 | 50 | 80 |
| 17 | Optical Microscope (per hour) | 10 | 10 | 20 | 30 |
| 18 | Spin Coater (per hour) | 10 | 10 | 20 | 30 |
| 19 | Laminar Flow (per hour) | 30 | 50 | 100 | 120 |
| 20 | Fume Hood (per hour) | 10 | 10 | 20 | 30 |
| 21 | Direct write using maskless lithography (complete process) (per hour) | ||||
| a.) Sample with pre-coat PR | 200 | 250 | 300 | 500 | |
| *maskless lithography, developer (AZ300), optical microscope, UV-Ozone Cleaner) | |||||
| b.) Sample without pre-coat PR | 300 | 350 | 400 | 600 | |
| *HMDS, PR (limited to AznLoF2020), spinner, hot plate, ULPA laminar flow bench, maskless lithography, developer (AZ300), optical microscope, UV-Ozone Cleaner) | |||||
| Lab Usage/Consultation Fee *For further inquiry and booking, please email to mundzir@usm.my | INOR Co-supervision | Industry | |||
| 22 | Lab usage fee (per person, per year)* | 2000 | - | ||
| * Limit to the use of fume hood, basic consumables, and basic equipments (eg. hotplate, UV-Ozone cleaner, etc) | |||||
| 23 | Consultation/analysis fee | Case By Case | |||
| 24 | Contract Services/Projects | Case By Case | |||
Laboratory Request Form
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Characterization Analysis Request Form [Word]
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Characterization Analysis Request Form [PDF]
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Fabrication Process Request Form [Word]
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Fabrication Process Request Form [PDF]
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Internal Substrate Request Form (CREST) USM [Word]
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Internal Substrate Request Form (CREST) USM [PDF]
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MOCVD Grown Sample Request Form [Word]
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MOCVD Grown Sample Request Form [PDF]
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Precious Materials Usage Request Form [Word]
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Precious Materials Usage Request Form [PDF]
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XRD Analysis Request Form [Word]
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XRD Analysis Request Form [PDF]